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82009 , Novolack, O-Naphto-Chinon-Diazide Etching Chemical for Etching in Liquid
82009 , Novolack, O-Naphto-Chinon-Diazide Etching Chemical for Etching in Liquid
82009 , Novolack, O-Naphto-Chinon-Diazide Etching Chemical for Etching in Liquid
82009 , Novolack, O-Naphto-Chinon-Diazide Etching Chemical for Etching in Liquid
KONTAKT POSITIV 20 - positive photo-sensitive lacquer Positive photo-sensitive lacquer for manufacturing printed circuit boards, with clear copper tracks laminated onto epoxy FR4 or Bakelite.
Positive work: can be used with a Mylar transparent film or a single traced design; the printed circuit diagram is always the image of the original positive.
Blue sensitive layer is resistant to etching agents when not insulated.
Perfectly uniform, even layer.
Kontakt Chemie

Kontakt Chemie 82009 82009, Novolack, O-Naphto-Chinon-Diazide Etching Chemical for Etching in Liquid

Manufacturer:
Kontakt Chemie
Manufacturer Part No:
82009
Enrgtech Part No:
ET21473864
Warranty:
Manufacturer
£ 18.55

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Process Type:

Etching

Material:

Novolack, O-Naphto-Chinon-Diazide

Ferric Chloride Form:

Liquid

Trade Name:

POSITIV 20